High Purity Xenon difluoride Gas (XeF2) Fluorocarbon Gases
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Appearance | white , solid crystals , pungent/ozone like | |||||||
Density | 4.32kg/L | |||||||
Melting Point | 128.6 °C | |||||||
Boiling Point | 114°C | |||||||
Vapor Pressure | 0.5Kpa at 25 °C | |||||||
Stablility to air | react with moisture in air to form HF . | |||||||
Stablility to water | 25 g/L at 0 °C and hydrolyses to form HF | |||||||
Solubility | Soluble in solvents such as BrF5, BrF3, IF5, anhydrous HF, and CH3CN, without reduction or oxidation . Solubility in HF is high , at 167g per 100g HF at 29.95°C. |
product description
Xenon difluoride (XeF2) is a colorless solid with a molecular weight of 169.30, it is easy to sublimate at room temperature and form transparent crystals. Xenon difluoride decomposes in neutral or alkaline solution, but it is stable in acidic solution and has a pungent odor in aqueous solutions. Vapor of xenon difluoride is colorless and has a disgusting stench. In the electronic industry, XeF2 is often used as etching gas of silicon, chemical reaction of XeF2 and silicon is spontaneous reaction, corrosion process of XeF2 to silicon has high selectivity, in the corrosion process of XeF2 to silicon, XeF2 gets to the surface of silicon substrate through free gas diffusion, and react with the outermost silicon atoms to generate gaseous Xe and gaseous SiF4, so as to realize corrosion of silicon.
Here is a detailed overview of the physical properties of difluorine xenon:
Uses
XeF2 is used in the synthesis of other xenon fluorides, which are important in the study of fluorine chemistry and in industrial applications.
It is also used in the electronics industry for etching processes.
Safety
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