High Purity Trichlorosilane TCS (SiHCl3) Specialty Gases
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Contact usSpecifications
| Purity ,% | 99.95 |
| Resistivity | ≥ 300 ohm-cm |
| Boron | ≤ 0.1 ppba silicon |
| Total Carbon | ≤ 5 ppma |
| Iron | ≤ 5 ppba |
| Other Chlorosilane | ≤ 500 ppm |
Technical Information
| Cylinder State @ 21.1°C | Liquid |
| Flammable Limits In Air | 7-83% |
| Auto Ignition Temperature (°C ) | 182 |
| Molecular Weight (g/mol) | 135.45 |
| Specific gravity (air =1) | 4.67 |
| Critical Temperature ( °C ) | 242.5 |
| Critical Pressure ( psig ) |
Description
Trichlorosilane is an inorganic compound with the formula HCl3Si. It is a colourless, volatile liquid. Purified trichlorosilane is the principal precursor to ultrapure silicon in the semiconductor industry. In water, it rapidly decomposes to produce a siloxane polymer while giving off hydrochloric acid. Because of its reactivity and wide availability, it is frequently used in the synthesis of silicon-containing organic compounds.
Trichlorosilane is highly reactive, and may respond violently (and even explosively) to many compounds.This also includes water, potentially producing silicon dioxide, chlorine, hydrogen, hydrogen chloride (and its aqueous form hydrochloric acid), and heat. Trichlorosilane can cause hazardous chemical reactions with moisture and humidity alone, and should be handled and stored under inert gas.Spills of trichlorosilane may be neutralized using a 1-1 ratio of sodium hydroxide, or a 2-1 ratio of sodium bicarbonate to trichlorosilane.Fires can be extinguished using alcohol-resistant aqueous film-forming foam.
Applications
● In organo silicon chemical reactions
● In semiconductor fabrication: epitaxial deposition of silicon.
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