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High Purity Boron Fluoride Gas (BF3) Fluorocarbon Gases

  • DOT Shipping Name Boron Trifluoride , Compressed
  • DOT Classification 2.3
  • DOT Label Poison Gas / InHalation Hazard
  • UN Number UN1008
  • CAS No. 7637-7-2
  • CGA/DISS/JIS/DIN477 330/642/W22-14L/NO.8
  • Shipped as Compressed Gas

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Specifications 

Purity , % 99.5 99.995
Oxygen + Nitrogen + Argon ≤10 ppmv
Carbon Dioxide ≤ 10 ppmv
Innert Gas ( Oxygen + Nitrogen + Carbon Dioxide ) ≤ 4000 ppm
Sulfur Dioxide ≤ 20 ppm ≤ 10 ppmv
Silicon Tetrafluoride  ≤ 300 ppm ≤3  ppmv
Water  ≤ 0.3 %

Technical Information

Cylinder State @ 21.1°C  Gas
Flammable Limits In Air  Non-flammable  
Auto Ignition Temperature (°C ) -
Molecular Weight (g/mol) 67.805
Specific gravity (air =1) 2.32
Critical Temperature ( °C ) -12.25 
Critical Pressure ( psig ) 708.32

Description 

Boron trifluoride (BF3) is a colorless, odorless, and highly toxic gas at room temperature. It is a non-metal halide with the molecular formula BF3 and is used in various industrial applications. Boron trifluoride is not soluble in water due to its non-polar nature, and it reacts with water to produce hydrofluoric acid (HF) and boric acid (H3BO3), which is why it is highly corrosive and requires careful handling.BF3 has a relatively low thermal conductivity, which is typical for gases, especially those with small molecules.As a gas, the viscosity of boron trifluoride is low and behaves similarly to other gases in this regard.Boron trifluoride is highly reactive, especially with water, and can form dangerous byproducts. It is also a strong Lewis acid and can react with a variety of substances.

BF3 is used as a catalyst in the chemical industry for various organic reactions, including the production of plastics and pharmaceuticals and also used in semiconductor manufacturing for etching processes.Boron trifluoride is toxic and can cause severe irritation or damage to the eyes, skin, and respiratory tract. It is important to handle and use boron trifluoride with appropriate safety measures.

Applications

· In semiconductor fabrication, boron trifluoride is used for p-type diffusion in silicon. 
· In ion implantation. 

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